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Exploration of etch step interactions in the dual patterning process for process modeling

dc.contributor.authorMelvin, Lawrence
dc.contributor.authorWard, Brian
dc.contributor.authorSong, H.
dc.contributor.authorRhie, S.U.
dc.contributor.authorLucas, K.D.
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorMaenhoudt, Mireille
dc.date.accessioned2021-10-17T08:55:59Z
dc.date.available2021-10-17T08:55:59Z
dc.date.issued2008
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14146
dc.sourceIIOimport
dc.titleExploration of etch step interactions in the dual patterning process for process modeling
dc.typeJournal article
dc.contributor.imecauthorWiaux, Vincent
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage2434
dc.source.endpage2434
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue6
dc.source.volume26
imec.availabilityPublished - open access
imec.internalnotesPaper from the 52nd Int.l Conf. on Electron, Ion, and Photon Beam Technology & Nanofabrication - EIPBN


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