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Active dopant profiling of advanced semiconductor devices using scanning spreading resistance microscopy

dc.contributor.authorMody, Jay
dc.contributor.authorEyben, Pierre
dc.contributor.authorPolspoel, Wouter
dc.contributor.authorSchulze, Andreas
dc.contributor.authorNazir, Aftab
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-17T09:06:53Z
dc.date.available2021-10-17T09:06:53Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14180
dc.sourceIIOimport
dc.titleActive dopant profiling of advanced semiconductor devices using scanning spreading resistance microscopy
dc.typeMeeting abstract
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorNazir, Aftab
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.conferenceDutch Scanning Probe Microscopy Symposium - SPM
dc.source.conferencedate8/12/2008
dc.source.conferencelocationUtrecht The Netherlands
imec.availabilityPublished - imec


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