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Advanced 2D/3D simulations for laser annealed device using an atomic kinetic monte carlo approach and scanning spreading resistance microscopy (SRRM)

dc.contributor.authorNoda, T.
dc.contributor.authorEyben, Pierre
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorVrancken, Christa
dc.contributor.authorRosseel, Erik
dc.contributor.authorOrtolland, Claude
dc.contributor.authorClarysse, Trudo
dc.contributor.authorGoossens, Jozefien
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorFelch, S.
dc.contributor.authorSchreutelkamp, Rob
dc.contributor.authorAbsil, Philippe
dc.contributor.authorJurczak, Gosia
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorBiesemans, Serge
dc.contributor.authorHoffmann, Thomas Y.
dc.date.accessioned2021-10-17T09:18:52Z
dc.date.available2021-10-17T09:18:52Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14219
dc.sourceIIOimport
dc.titleAdvanced 2D/3D simulations for laser annealed device using an atomic kinetic monte carlo approach and scanning spreading resistance microscopy (SRRM)
dc.typeProceedings paper
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage539
dc.source.endpage542
dc.source.conferenceTechnical Digest International Electron Devices Meeting - IEDM
dc.source.conferencedate15/12/2008
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access


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