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Strain engineering for high mobility channels

dc.contributor.authorOlsen, S.
dc.contributor.authorAl Tarawneh, Z.
dc.contributor.authorVarzgar, J,
dc.contributor.authorEscobedo-Cousin, E.
dc.contributor.authorAgaiby, R.
dc.contributor.authorDobrosz, P.
dc.contributor.authorO'Neill, A.
dc.contributor.authorHellstrom, P.E.
dc.contributor.authorOstling, M.
dc.contributor.authorParker, E.
dc.contributor.authorLoo, Roger
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-17T09:29:13Z
dc.date.available2021-10-17T09:29:13Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14250
dc.sourceIIOimport
dc.titleStrain engineering for high mobility channels
dc.typeOral presentation
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.conferenceInternational Conference on Semiconductor Technology
dc.source.conferencedate15/03/2008
dc.source.conferencelocationShanghai China
imec.availabilityPublished - imec


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