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Reduced self-heating by strained silicon substrate engineering

dc.contributor.authorO'Neill, Anthony
dc.contributor.authorAgaiby, Rimoon
dc.contributor.authorOlsen, Sarah
dc.contributor.authorYang, Y.
dc.contributor.authorHellstrom, P.-E.
dc.contributor.authorOstling, M.
dc.contributor.authorOehme, M.
dc.contributor.authorLyutovich, K.
dc.contributor.authorKasper, E.
dc.contributor.authorEneman, Geert
dc.contributor.authorVerheyen, Peter
dc.contributor.authorLoo, Roger
dc.contributor.authorClaeys, Cor
dc.contributor.authorFiegna, C.
dc.contributor.authorSangiorgi, E.
dc.date.accessioned2021-10-17T09:29:56Z
dc.date.available2021-10-17T09:29:56Z
dc.date.issued2008
dc.identifier.issn0169-4332
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14252
dc.sourceIIOimport
dc.titleReduced self-heating by strained silicon substrate engineering
dc.typeJournal article
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewyes
dc.source.beginpage6182
dc.source.endpage6185
dc.source.journalApplied Surface Science
dc.source.issue19
dc.source.volume254
imec.availabilityPublished - imec


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