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Performance enhancement of PFET planar devices by plasma immersion ion implantation (P3i)

dc.contributor.authorOrtolland, Claude
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorKerner, Christoph
dc.contributor.authorChiarella, Thomas
dc.contributor.authorEyben, Pierre
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorAgua Borniquel, Jose
dc.contributor.authorPoon, Tse
dc.contributor.authorSanthanam, Kartik
dc.contributor.authorPorshnev, Peter
dc.contributor.authorFoad, Majeed
dc.contributor.authorSchreutelkamp, Robert
dc.contributor.authorAbsil, Philippe
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorFelch, Susan
dc.contributor.authorHoffmann, Thomas Y.
dc.date.accessioned2021-10-17T09:31:01Z
dc.date.available2021-10-17T09:31:01Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14255
dc.sourceIIOimport
dc.titlePerformance enhancement of PFET planar devices by plasma immersion ion implantation (P3i)
dc.typeProceedings paper
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorKerner, Christoph
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.source.peerreviewno
dc.source.beginpage465
dc.source.endpage468
dc.source.conference17th International Conference on Ion Implantation Technology - IIT
dc.source.conferencedate8/06/2008
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesAIP Conference Proceedings; Vol. 1066


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