High precision micro-scale Hall effect characterization method using in-line micro four-point probes
dc.contributor.author | Petersen, Dirch | |
dc.contributor.author | Hansen, Olaf | |
dc.contributor.author | Clarysse, Trudo | |
dc.contributor.author | Goossens, Jozefien | |
dc.contributor.author | Rosseel, Erik | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.contributor.author | Lin, Rong | |
dc.contributor.author | Nielsen, Peter | |
dc.date.accessioned | 2021-10-17T09:48:45Z | |
dc.date.available | 2021-10-17T09:48:45Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14308 | |
dc.source | IIOimport | |
dc.title | High precision micro-scale Hall effect characterization method using in-line micro four-point probes | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Rosseel, Erik | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 251 | |
dc.source.endpage | 255 | |
dc.source.conference | 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP | |
dc.source.conferencedate | 30/09/2008 | |
dc.source.conferencelocation | Las Vegas, NV USA | |
imec.availability | Published - open access |