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Photoresist coating and patterning for through-silicon via technology

dc.contributor.authorPham, Nga
dc.contributor.authorSabuncuoglu Tezcan, Deniz
dc.contributor.authorRuythooren, Wouter
dc.contributor.authorDe Moor, Piet
dc.contributor.authorMajeed, Bivragh
dc.contributor.authorBaert, Kris
dc.contributor.authorSwinnen, Bart
dc.date.accessioned2021-10-17T09:50:09Z
dc.date.available2021-10-17T09:50:09Z
dc.date.issued2008
dc.identifier.issn0960-1317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14312
dc.sourceIIOimport
dc.titlePhotoresist coating and patterning for through-silicon via technology
dc.typeJournal article
dc.contributor.imecauthorPham, Nga
dc.contributor.imecauthorSabuncuoglu Tezcan, Deniz
dc.contributor.imecauthorRuythooren, Wouter
dc.contributor.imecauthorDe Moor, Piet
dc.contributor.imecauthorMajeed, Bivragh
dc.contributor.imecauthorSwinnen, Bart
dc.contributor.orcidimecSabuncuoglu Tezcan, Deniz::0000-0002-9237-7862
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage125008
dc.source.journalJournal of Micromechanics and Microengineering
dc.source.issue12
dc.source.volume18
dc.identifier.urlhttp://iopscience.iop.org/9060-1317/18/12/125008
imec.availabilityPublished - open access


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