Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths
dc.contributor.author | Prager, L. | |
dc.contributor.author | Marsik, Premysl | |
dc.contributor.author | Wennrich, L. | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.contributor.author | Naumov, S. | |
dc.contributor.author | Pistol, L. | |
dc.contributor.author | Schneider, D. | |
dc.contributor.author | Gerlach, J.W. | |
dc.contributor.author | Verdonck, Patrick | |
dc.contributor.author | Buchmeiser, M.R. | |
dc.date.accessioned | 2021-10-17T10:00:05Z | |
dc.date.available | 2021-10-17T10:00:05Z | |
dc.date.issued | 2008 | |
dc.identifier.issn | 0167-9317 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14342 | |
dc.source | IIOimport | |
dc.title | Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths | |
dc.type | Journal article | |
dc.contributor.imecauthor | Verdonck, Patrick | |
dc.contributor.orcidimec | Verdonck, Patrick::0000-0003-2454-0602 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 2094 | |
dc.source.endpage | 2097 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.issue | 10 | |
dc.source.volume | 85 | |
imec.availability | Published - open access | |
imec.internalnotes | MAM 2008 |