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Characterization and optimization of CD control for 0.25µm CMOS applications

dc.contributor.authorRonse, Kurt
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorYen, Anthony
dc.contributor.authorKim, Kee - Ho
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T15:19:10Z
dc.date.available2021-09-29T15:19:10Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1435
dc.sourceIIOimport
dc.titleCharacterization and optimization of CD control for 0.25µm CMOS applications
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage555
dc.source.endpage563
dc.source.conferenceOptical Microlithography IX
dc.source.conferencedate10/03/1996
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 2726


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