dc.contributor.author | Rathsack, Ben | |
dc.contributor.author | Hooge, Joshua | |
dc.contributor.author | Scheer, Steven | |
dc.contributor.author | Nafus, Kathleen | |
dc.contributor.author | Hatakeyama, Shinichi | |
dc.contributor.author | Kouichi, Hontake | |
dc.contributor.author | Kitano, Junichi | |
dc.contributor.author | Van Den Heuvel, Dieter | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Foubert, Philippe | |
dc.contributor.author | Gronheid, Roel | |
dc.date.accessioned | 2021-10-17T10:06:39Z | |
dc.date.available | 2021-10-17T10:06:39Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14362 | |
dc.source | IIOimport | |
dc.title | Image contrast contributions to immersion lithography defect formation and process yield | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Scheer, Steven | |
dc.contributor.imecauthor | Nafus, Kathleen | |
dc.contributor.imecauthor | Van Den Heuvel, Dieter | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 69244W | |
dc.source.conference | Optical Microlithography XXI | |
dc.source.conferencedate | 24/02/2008 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; vol. 6924 | |