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Image contrast contributions to immersion lithography defect formation and process yield

dc.contributor.authorRathsack, Ben
dc.contributor.authorHooge, Joshua
dc.contributor.authorScheer, Steven
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHatakeyama, Shinichi
dc.contributor.authorKouichi, Hontake
dc.contributor.authorKitano, Junichi
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorLeray, Philippe
dc.contributor.authorHendrickx, Eric
dc.contributor.authorFoubert, Philippe
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-17T10:06:39Z
dc.date.available2021-10-17T10:06:39Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14362
dc.sourceIIOimport
dc.titleImage contrast contributions to immersion lithography defect formation and process yield
dc.typeProceedings paper
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage69244W
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 6924


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