Show simple item record

Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials

dc.contributor.authorRathsack, Ben
dc.contributor.authorScheer, Steven
dc.contributor.authorKuwahara, Yuhei
dc.contributor.authorKitano, Junichi
dc.contributor.authorGronheid, Roel
dc.contributor.authorBaerts, Christina
dc.date.accessioned2021-10-17T10:06:59Z
dc.date.available2021-10-17T10:06:59Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14363
dc.sourceIIOimport
dc.titleFinite element modeling of PAG leaching and water uptake in immersion lithography resist materials
dc.typeProceedings paper
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorBaerts, Christina
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage692315
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXV
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 6923


Files in this item

Thumbnail
Name:
15378.pdf
Size:
211.5Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record