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Understanding improved TANOS retention by material analysis of the SixNy trapping layer

dc.contributor.authorRothschild, Aude
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorBreuil, Laurent
dc.contributor.authorCacciato, Antonio
dc.contributor.authorDekkers, Harold
dc.contributor.authorSleeckx, Erik
dc.contributor.authorConard, Thierry
dc.contributor.authorBrijs, Bert
dc.contributor.authorKittl, Jorge
dc.date.accessioned2021-10-17T10:17:12Z
dc.date.available2021-10-17T10:17:12Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14392
dc.sourceIIOimport
dc.titleUnderstanding improved TANOS retention by material analysis of the SixNy trapping layer
dc.typeProceedings paper
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorBreuil, Laurent
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorConard, Thierry
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecBreuil, Laurent::0000-0003-2869-1651
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage2110
dc.source.conference214th ECS Meeting
dc.source.conferencedate12/10/2008
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesECS Meeting Abstracts; MA 2008-02


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