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Interface and defect control for group IV channel engineering

dc.contributor.authorSakai, Akira
dc.contributor.authorOhara, Yuji
dc.contributor.authorUeda, Takaya
dc.contributor.authorToyoda, Eiji
dc.contributor.authorIzunome, Koji
dc.contributor.authorTakeuchi, Shotaro
dc.contributor.authorShimura, Yosuke
dc.contributor.authorNakatsuka, Osamu
dc.contributor.authorOgawa, Masaki
dc.contributor.authorZaima, Shigeaki
dc.contributor.authorKimura, Shigeru
dc.date.accessioned2021-10-17T10:23:37Z
dc.date.available2021-10-17T10:23:37Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14411
dc.sourceIIOimport
dc.titleInterface and defect control for group IV channel engineering
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.beginpage687
dc.source.endpage698
dc.source.conferenceSiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices
dc.source.conferencedate12/10/2008
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; vol. 16, Issue 10


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