Single-wafer wet chemical oxide formation for pre-ALD high-k deposition on 300 mm wafer

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Authors
Sano, K.; Izumi, A.; Eitoku, A.; Snow, J.; Nyns, Laura; Kubicek, Stefan; Singanamalla, Raghunath; Richard, Olivier; Conard, Thierry; Vos, Rita; Mertens, Paul
Conference
Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS
Title
Single-wafer wet chemical oxide formation for pre-ALD high-k deposition on 300 mm wafer
Publication type
Proceedings paper
Embargo date
9999-12-31
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