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Fabrication of nanophotonic circuit components by thermal nano imprint lithography

dc.contributor.authorScheerlinck, Stijn
dc.contributor.authorPedersen, R.
dc.contributor.authorDumon, Pieter
dc.contributor.authorBogaerts, Wim
dc.contributor.authorPlachetka, U.
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorBaets, Roel
dc.contributor.authorKristensen, A.
dc.date.accessioned2021-10-17T10:29:59Z
dc.date.available2021-10-17T10:29:59Z
dc.date.issued2008-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14429
dc.sourceIIOimport
dc.titleFabrication of nanophotonic circuit components by thermal nano imprint lithography
dc.typeProceedings paper
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpagepaper nr. CF02
dc.source.conferenceConference on Lasers and Electro-Optics (CLEO) Quantum Electronics and Laser Science Conference (QELS)
dc.source.conferencedate4/05/2008
dc.source.conferencelocationSan José, CA USA
imec.availabilityPublished - imec


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