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EUV pattern shift compensation strategies

dc.contributor.authorSchmoeller, Thomas
dc.contributor.authorKlimpel, Thomas
dc.contributor.authorKim, In Sung
dc.contributor.authorLorusso, Gian
dc.contributor.authorMyers, Alan
dc.contributor.authorJonckheere, Rik
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-17T10:31:50Z
dc.date.available2021-10-17T10:31:50Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14434
dc.sourceIIOimport
dc.titleEUV pattern shift compensation strategies
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage69211B
dc.source.conferenceEmerging Lithographic Technologies XII
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE, vol. 6921


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