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Novel process to pattern selectively dual dielectric capping layers using soft-mask only

dc.contributor.authorSchram, Tom
dc.contributor.authorKubicek, Stefan
dc.contributor.authorRohr, Erika
dc.contributor.authorBrus, Stephan
dc.contributor.authorVrancken, Christa
dc.contributor.authorChang, Shou-Zen
dc.contributor.authorChang, V.S.
dc.contributor.authorMitsuhashi, Riichiru
dc.contributor.authorOkuno, Yasutoshi
dc.contributor.authorAkheyar, Amal
dc.contributor.authorCho, Hag-Ju
dc.contributor.authorHooker, J.C.
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorVos, Rita
dc.contributor.authorSebaai, Farid
dc.contributor.authorErcken, Monique
dc.contributor.authorKelkar, Prasad
dc.contributor.authorDelabie, Annelies
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorWitters, Thomas
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorKerner, Christoph
dc.contributor.authorChiarella, Thomas
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorCho, Moon Ju
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorLauwers, Anne
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorAbsil, Philippe
dc.contributor.authorBiesemans, Serge
dc.date.accessioned2021-10-17T10:34:38Z
dc.date.available2021-10-17T10:34:38Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14441
dc.sourceIIOimport
dc.titleNovel process to pattern selectively dual dielectric capping layers using soft-mask only
dc.typeProceedings paper
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorKerner, Christoph
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage44
dc.source.endpage45
dc.source.conferenceSymposium on VLSI Technology Digest of Technical Papers
dc.source.conferencedate17/06/2008
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access


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