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TaN etch mechanisms in BCl3-based plasmas

dc.contributor.authorShamiryan, Denis
dc.contributor.authorDanila, Andrey
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-17T10:40:51Z
dc.date.available2021-10-17T10:40:51Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14459
dc.sourceIIOimport
dc.titleTaN etch mechanisms in BCl3-based plasmas
dc.typeMeeting abstract
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferenceAmerican Vacuum Society 55th International Symposium
dc.source.conferencedate19/10/2008
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - open access


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