dc.contributor.author | Shamiryan, Denis | |
dc.contributor.author | Danila, Andrey | |
dc.contributor.author | Paraschiv, Vasile | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.contributor.author | Boullart, Werner | |
dc.date.accessioned | 2021-10-17T10:40:51Z | |
dc.date.available | 2021-10-17T10:40:51Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14459 | |
dc.source | IIOimport | |
dc.title | TaN etch mechanisms in BCl3-based plasmas | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Paraschiv, Vasile | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.conference | American Vacuum Society 55th International Symposium | |
dc.source.conferencedate | 19/10/2008 | |
dc.source.conferencelocation | Boston, MA USA | |
imec.availability | Published - open access | |