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Using ellipsometry for assessment of TiN surface roughness after plasma etch

dc.contributor.authorShamiryan, Denis
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorDictus, Dries
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBeckx, Stephan
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-17T10:41:13Z
dc.date.available2021-10-17T10:41:13Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14460
dc.sourceIIOimport
dc.titleUsing ellipsometry for assessment of TiN surface roughness after plasma etch
dc.typeJournal article
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorDictus, Dries
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecDictus, Dries::0000-0002-7896-1747
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageH108
dc.source.endpageH112
dc.source.journalJournal of the Electrochemical Sosiety
dc.source.issue2
dc.source.volume155
imec.availabilityPublished - open access


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