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Particle deposition and removal from Ge wafers

dc.contributor.authorSioncke, Sonja
dc.contributor.authorLux, Marcel
dc.contributor.authorFyen, Wim
dc.contributor.authorMeuris, Marc
dc.contributor.authorTheuwis, A.
dc.date.accessioned2021-10-17T10:51:51Z
dc.date.available2021-10-17T10:51:51Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14488
dc.sourceIIOimport
dc.titleParticle deposition and removal from Ge wafers
dc.typeProceedings paper
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage173
dc.source.endpage176
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate18/09/2006
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 134


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