dc.contributor.author | Sioncke, Sonja | |
dc.contributor.author | Lux, Marcel | |
dc.contributor.author | Fyen, Wim | |
dc.contributor.author | Meuris, Marc | |
dc.contributor.author | Theuwis, A. | |
dc.date.accessioned | 2021-10-17T10:51:51Z | |
dc.date.available | 2021-10-17T10:51:51Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14488 | |
dc.source | IIOimport | |
dc.title | Particle deposition and removal from Ge wafers | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Lux, Marcel | |
dc.contributor.imecauthor | Meuris, Marc | |
dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 173 | |
dc.source.endpage | 176 | |
dc.source.conference | Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS | |
dc.source.conferencedate | 18/09/2006 | |
dc.source.conferencelocation | Antwerpen Belgium | |
imec.availability | Published - open access | |
imec.internalnotes | Solid State Phenomena; Vol. 134 | |