Systematic TLM measurements of NiSi and PtSi specific contact resistance to n- and p- type Si in a broad doping range
dc.contributor.author | Stavitski, Natalie | |
dc.contributor.author | Van Dal, Mark J. H. | |
dc.contributor.author | Lauwers, Anne | |
dc.contributor.author | Vrancken, Christa | |
dc.contributor.author | Kovalgin, Alexey Y. | |
dc.contributor.author | Wolters, Rob A.M. | |
dc.date.accessioned | 2021-10-17T11:00:22Z | |
dc.date.available | 2021-10-17T11:00:22Z | |
dc.date.issued | 2008 | |
dc.identifier.issn | 0741-3106 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14512 | |
dc.source | IIOimport | |
dc.title | Systematic TLM measurements of NiSi and PtSi specific contact resistance to n- and p- type Si in a broad doping range | |
dc.type | Journal article | |
dc.contributor.imecauthor | Lauwers, Anne | |
dc.contributor.imecauthor | Vrancken, Christa | |
dc.source.peerreview | yes | |
dc.source.beginpage | 378 | |
dc.source.endpage | 381 | |
dc.source.journal | IEEE Electron Device Letters | |
dc.source.issue | 4 | |
dc.source.volume | 29 | |
imec.availability | Published - imec |
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