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Impact of illumination source symmetrization in OPC

dc.contributor.authorSturtevant, John L.
dc.contributor.authorHong, Le
dc.contributor.authorJayaram, Srividya
dc.contributor.authorRenwick, Stephen P.
dc.contributor.authorMcCallum, Martin
dc.contributor.authorDe Bisschop, Peter
dc.date.accessioned2021-10-17T11:04:16Z
dc.date.available2021-10-17T11:04:16Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14523
dc.sourceIIOimport
dc.titleImpact of illumination source symmetrization in OPC
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.source.peerreviewno
dc.source.beginpage70283M
dc.source.conferencePhotomask and Next-Generation Lithography Mask Technology XV
dc.source.conferencedate16/04/2008
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 7028


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