Elucidating advanced inhibitor material in copper CMP: K-sorbate as a passivator
dc.contributor.author | Tamir, Magi | |
dc.contributor.author | Vaes, Jan | |
dc.contributor.author | Ein Eli, Yair | |
dc.date.accessioned | 2021-10-17T11:09:56Z | |
dc.date.available | 2021-10-17T11:09:56Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14539 | |
dc.source | IIOimport | |
dc.title | Elucidating advanced inhibitor material in copper CMP: K-sorbate as a passivator | |
dc.type | Proceedings paper | |
dc.source.peerreview | yes | |
dc.source.conference | 13th International CMP Planarization for ULSI Multilevel Interconnection Conference - CMP-MIC | |
dc.source.conferencedate | 3/03/2008 | |
dc.source.conferencelocation | Fremont, CA USA | |
imec.availability | Published - imec |
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