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dc.contributor.authorTamir, Magi
dc.contributor.authorVaes, Jan
dc.contributor.authorEin Eli, Yair
dc.date.accessioned2021-10-17T11:09:56Z
dc.date.available2021-10-17T11:09:56Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14539
dc.sourceIIOimport
dc.titleElucidating advanced inhibitor material in copper CMP: K-sorbate as a passivator
dc.typeProceedings paper
dc.source.peerreviewyes
dc.source.conference13th International CMP Planarization for ULSI Multilevel Interconnection Conference - CMP-MIC
dc.source.conferencedate3/03/2008
dc.source.conferencelocationFremont, CA USA
imec.availabilityPublished - imec


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