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Cluster optimization to improve total CD control as an enabler for double patterning

dc.contributor.authorTedeschi, Len
dc.contributor.authorRosslee, C.
dc.contributor.authorLaidler, David
dc.contributor.authorLeray, Philippe
dc.contributor.authorD'have, Koen
dc.date.accessioned2021-10-17T11:10:41Z
dc.date.available2021-10-17T11:10:41Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14541
dc.sourceIIOimport
dc.titleCluster optimization to improve total CD control as an enabler for double patterning
dc.typeProceedings paper
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorD'have, Koen
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.source.peerreviewno
dc.source.beginpage714023
dc.source.conferenceLitography ASIA
dc.source.conferencedate4/11/2008
dc.source.conferencelocationTaipei Taiwan
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE, vol. 7140


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