dc.contributor.author | Tokei, Zsolt | |
dc.contributor.author | Li, Yunlong | |
dc.contributor.author | Ciofi, Ivan | |
dc.contributor.author | Croes, Kristof | |
dc.contributor.author | Beyer, Gerald | |
dc.date.accessioned | 2021-10-17T11:19:56Z | |
dc.date.available | 2021-10-17T11:19:56Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14566 | |
dc.source | IIOimport | |
dc.title | Low-k dielectric reliability: impact of test structure choice, copper and integrated dielectric quality | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Tokei, Zsolt | |
dc.contributor.imecauthor | Li, Yunlong | |
dc.contributor.imecauthor | Ciofi, Ivan | |
dc.contributor.imecauthor | Croes, Kristof | |
dc.contributor.imecauthor | Beyer, Gerald | |
dc.contributor.orcidimec | Li, Yunlong::0000-0003-4791-4013 | |
dc.contributor.orcidimec | Ciofi, Ivan::0000-0003-1374-4116 | |
dc.contributor.orcidimec | Croes, Kristof::0000-0002-3955-0638 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 111 | |
dc.source.endpage | 113 | |
dc.source.conference | 11th IEEE International Interconnect Technology Conference - IITC | |
dc.source.conferencedate | 1/06/2008 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - open access | |