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Real-time monitoring of wet chemial oxidation and etching processes on semiconductor surfaces for process optimization and waste minimization

dc.contributor.authorSchmidt, Harald
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorBiesemans, Serge
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T15:22:07Z
dc.date.available2021-09-29T15:22:07Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1457
dc.sourceIIOimport
dc.titleReal-time monitoring of wet chemial oxidation and etching processes on semiconductor surfaces for process optimization and waste minimization
dc.typeMeeting abstract
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage393
dc.source.conferenceElectrochemical Society 190th Fall Meeting: Symposium on Environmental Aspects of Electrochemical Technology
dc.source.conferencedate6/10/1996
dc.source.conferencelocationSan Antonio, TX USA
imec.availabilityPublished - open access
imec.internalnotesMeeting Abstracts; Vol. 96-2


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