Double-patterning decomposition, design compliance, and verification algorithms at 32nm hp

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Authors
Tritchkov, Alex; Glotov, Petr; Komirenko, Sergey; Sahouria, Emile; Torres, Andres; Seoud, Ahmed; Wiaux, Vincent
Conference
Photomask Technology 2008
Title
Double-patterning decomposition, design compliance, and verification algorithms at 32nm hp
Publication type
Proceedings paper
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