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Oxygen chemiluminescence in a He plasma as a method for plasma damage evaluation of low-k dielectrics

dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorShamiryan, Denis
dc.contributor.authorSoberon, Felipe
dc.contributor.authorDaniels, Stephen
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-17T11:27:41Z
dc.date.available2021-10-17T11:27:41Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14586
dc.sourceIIOimport
dc.titleOxygen chemiluminescence in a He plasma as a method for plasma damage evaluation of low-k dielectrics
dc.typeMeeting abstract
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage231
dc.source.endpage232
dc.source.conference17th Workshop Materials for Advanced Metallization
dc.source.conferencedate2/03/2008
dc.source.conferencelocationDresden Germany
imec.availabilityPublished - imec
imec.internalnoteshttp://www.mam-conference.org/


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