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Effects of bias, pressure and temperature in plasma damage of ultra low-k films

dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorHumbert, Aurelie
dc.contributor.authorMannaert, Geert
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-17T11:28:03Z
dc.date.available2021-10-17T11:28:03Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14587
dc.sourceIIOimport
dc.titleEffects of bias, pressure and temperature in plasma damage of ultra low-k films
dc.typeProceedings paper
dc.contributor.imecauthorHumbert, Aurelie
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecHumbert, Aurelie::0000-0002-2538-8991
dc.source.peerreviewyes
dc.source.beginpage317
dc.source.endpage320
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate18/09/2006
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 134


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