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Detection of split design-related weak points in double patterning using PQW and bright-field defect inspection

dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorCheng, Shaunee
dc.contributor.authorLeray, Philippe
dc.contributor.authorWiaux, Vincent
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorD'have, Koen
dc.contributor.authorJaenen, Patrick
dc.contributor.authorMarcuccilli, Gino
dc.contributor.authorMalik, Irfan
dc.contributor.authorKlein, Sophie
dc.date.accessioned2021-10-17T11:42:48Z
dc.date.available2021-10-17T11:42:48Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14627
dc.sourceIIOimport
dc.titleDetection of split design-related weak points in double patterning using PQW and bright-field defect inspection
dc.typeProceedings paper
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorD'have, Koen
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.source.peerreviewno
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
imec.availabilityPublished - imec
imec.internalnotese-proceedings


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