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Silicate formation and thermal stability of rare earth oxides as high-k gate dielectrics

dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorConard, Thierry
dc.contributor.authorDelabie, Annelies
dc.contributor.authorFranquet, Alexis
dc.contributor.authorNyns, Laura
dc.contributor.authorRichard, Olivier
dc.contributor.authorLehnen, Peer
dc.contributor.authorSwerts, Johan
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-17T11:47:01Z
dc.date.available2021-10-17T11:47:01Z
dc.date.issued2008
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14638
dc.sourceIIOimport
dc.titleSilicate formation and thermal stability of rare earth oxides as high-k gate dielectrics
dc.typeJournal article
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage724
dc.source.endpage730
dc.source.journalJournal of Vacuum Science and Technology A
dc.source.issue4
dc.source.volume26
imec.availabilityPublished - imec


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