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Impact of process optimizations on the electrical performance of high-k layers deposited by aqueous chemical solution deposition

dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorHardy, An
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorFranquet, Alexis
dc.contributor.authorRichard, Olivier
dc.contributor.authorVan Bael, Marlies
dc.contributor.authorMullens, J.
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-17T11:47:27Z
dc.date.available2021-10-17T11:47:27Z
dc.date.issued2008
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14639
dc.sourceIIOimport
dc.titleImpact of process optimizations on the electrical performance of high-k layers deposited by aqueous chemical solution deposition
dc.typeJournal article
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageG91
dc.source.endpageG95
dc.source.journalJournal of the Electrochemical Society
dc.source.issue4
dc.source.volume155
imec.availabilityPublished - open access


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