dc.contributor.author | Van Look, Lieve | |
dc.contributor.author | Bekaert, Joost | |
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | Van de Kerkhove, Jeroen | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Schreel, Koen | |
dc.contributor.author | Menger, Jasper | |
dc.contributor.author | Schiffelers, Guido | |
dc.contributor.author | Knols, Edwin | |
dc.contributor.author | Willekers, Rob | |
dc.date.accessioned | 2021-10-17T11:57:51Z | |
dc.date.available | 2021-10-17T11:57:51Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14667 | |
dc.source | IIOimport | |
dc.title | Tool-to-tool optical proximity effect matching | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Van Look, Lieve | |
dc.contributor.imecauthor | Bekaert, Joost | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.contributor.imecauthor | Van de Kerkhove, Jeroen | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Schiffelers, Guido | |
dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 69241Q | |
dc.source.conference | Optical Microlithography XXI | |
dc.source.conferencedate | 24/02/2008 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; vol. 6924 | |