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dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorSchreel, Koen
dc.contributor.authorMenger, Jasper
dc.contributor.authorSchiffelers, Guido
dc.contributor.authorKnols, Edwin
dc.contributor.authorWillekers, Rob
dc.date.accessioned2021-10-17T11:57:51Z
dc.date.available2021-10-17T11:57:51Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14667
dc.sourceIIOimport
dc.titleTool-to-tool optical proximity effect matching
dc.typeProceedings paper
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage69241Q
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 6924


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