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Resolution, line width roughness and sensitivity in advanced photoresists

dc.contributor.authorVan Steenwinckel, David
dc.contributor.authorGronheid, Roel
dc.contributor.authorLammers, J.H.
dc.date.accessioned2021-10-17T12:03:09Z
dc.date.available2021-10-17T12:03:09Z
dc.date.issued2008
dc.identifier.issn1363-5182
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14680
dc.sourceIIOimport
dc.titleResolution, line width roughness and sensitivity in advanced photoresists
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage65
dc.source.endpage72
dc.source.journalFuture Fab International
dc.source.volume26
imec.availabilityPublished - open access


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