Resolution, line width roughness and sensitivity in advanced photoresists

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Authors

Van Steenwinckel, David; Gronheid, Roel; Lammers, J.H.

ISSN

1363-5182

Journal

Future Fab International

Volume

26

Title

Resolution, line width roughness and sensitivity in advanced photoresists

Publication type

Journal article

Embargo date

9999-12-31

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