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Resolution, line width roughness and sensitivity in advanced photoresists
Publication:
Resolution, line width roughness and sensitivity in advanced photoresists
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Date
2008
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17715.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Steenwinckel, David
;
Gronheid, Roel
;
Lammers, J.H.
Journal
Future Fab International
Abstract
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1930
since deposited on 2021-10-17
2
last month
Acq. date: 2025-12-11
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Metrics
Views
1930
since deposited on 2021-10-17
2
last month
Acq. date: 2025-12-11
Citations