Resolution, line width roughness and sensitivity in advanced photoresists

dc.contributor.author	Van Steenwinckel, David
dc.contributor.author	Gronheid, Roel
dc.contributor.author	Lammers, J.H.
dc.contributor.imecauthor	Gronheid, Roel
dc.date.accessioned	2021-10-17T12:03:09Z
dc.date.available	2021-10-17T12:03:09Z
dc.date.embargo	9999-12-31
dc.date.issued	2008
dc.identifier.issn	1363-5182
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/14680
dc.source.beginpage	65
dc.source.endpage	72
dc.source.journal	Future Fab International
dc.source.volume	26
dc.title	Resolution, line width roughness and sensitivity in advanced photoresists
dc.type	Journal article
dspace.entity.type	Publication
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