dc.contributor.author | Van Steenwinckel, David | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | Van Roey, Frieda | |
dc.contributor.author | Willems, Patrick | |
dc.contributor.author | Lammers, Jeroen H. | |
dc.date.accessioned | 2021-10-17T12:03:31Z | |
dc.date.available | 2021-10-17T12:03:31Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14681 | |
dc.source | IIOimport | |
dc.title | A novel method for characterizing resist performance | |
dc.type | Journal article | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.contributor.imecauthor | Van Roey, Frieda | |
dc.contributor.imecauthor | Willems, Patrick | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 23002 | |
dc.source.journal | Journal of Micro/Nanolithography, MEMS, and MOEMS | |
dc.source.issue | 2 | |
dc.source.volume | 7 | |
imec.availability | Published - open access | |