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U.V. activated cleaning using NO, HCl and NO/HCl

dc.contributor.authorElsmore, Chris
dc.contributor.authorGluck, Ronald
dc.contributor.authorCarr, Philip
dc.contributor.authorMeuris, Marc
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T12:41:06Z
dc.date.available2021-09-29T12:41:06Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/146
dc.sourceIIOimport
dc.titleU.V. activated cleaning using NO, HCl and NO/HCl
dc.typeProceedings paper
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage125
dc.source.endpage129
dc.source.conferenceProceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate19/09/1994
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - open access


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