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EXLE-SIMS: dramatically enhanced accuracy for dose loss metrology

dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorVos, Rita
dc.contributor.authorSalima, A.J.
dc.contributor.authorMerkulov, A.
dc.contributor.authorNakajima, K.
dc.contributor.authorKimura, K.
dc.date.accessioned2021-10-17T12:14:59Z
dc.date.available2021-10-17T12:14:59Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14710
dc.sourceIIOimport
dc.titleEXLE-SIMS: dramatically enhanced accuracy for dose loss metrology
dc.typeProceedings paper
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVos, Rita
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage109
dc.source.endpage112
dc.source.conference17th International Conference in Ion Implantation Technology - IIT
dc.source.conferencedate8/06/2008
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - open access
imec.internalnotesAIP Conference Proceedings; Vol. 1066


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