dc.contributor.author | Vereecke, Guy | |
dc.contributor.author | Veltens, T. | |
dc.contributor.author | Eitoku, A. | |
dc.contributor.author | Sano, Ken-Ichi | |
dc.contributor.author | Doumen, Geert | |
dc.contributor.author | Fyen, Wim | |
dc.contributor.author | Wostyn, Kurt | |
dc.contributor.author | Snow, J. | |
dc.contributor.author | Mertens, Paul | |
dc.date.accessioned | 2021-10-17T12:28:11Z | |
dc.date.available | 2021-10-17T12:28:11Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14740 | |
dc.source | IIOimport | |
dc.title | Removal of nano-particles by mixed-fluid jet: evaluation of cleaning performance and comparison with megasonic | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Vereecke, Guy | |
dc.contributor.imecauthor | Doumen, Geert | |
dc.contributor.imecauthor | Wostyn, Kurt | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
dc.contributor.orcidimec | Wostyn, Kurt::0000-0003-3995-0292 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 193 | |
dc.source.endpage | 196 | |
dc.source.conference | Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS | |
dc.source.conferencedate | 18/09/2006 | |
dc.source.conferencelocation | Antwerpen Belgium | |
imec.availability | Published - open access | |
imec.internalnotes | Solid State Phenomena; Vol. 134 | |