Confined chemical cleaning: a novel concept evaluated for front end of line applications

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Authors
Vos, Ingrid; Peeters, Stefan; Verbeeck, Rita; Boullart, Werner; Vertommen, Johan
Conference
Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS
Title
Confined chemical cleaning: a novel concept evaluated for front end of line applications
Publication type
Proceedings paper
Embargo date
9999-12-31
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