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Effect of chemical growth air filter for wafer storage before epitaxial growth

dc.contributor.authorWada, Masayuki
dc.contributor.authorSano, Tomohiro
dc.contributor.authorLeys, Frederik
dc.contributor.authorDilliway, G.
dc.contributor.authorLoo, Roger
dc.contributor.authorMertens, Paul
dc.contributor.authorSnow, j.
dc.contributor.authorIzumi, A.
dc.contributor.authorEitoku, A.
dc.date.accessioned2021-10-17T12:39:41Z
dc.date.available2021-10-17T12:39:41Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14768
dc.sourceIIOimport
dc.titleEffect of chemical growth air filter for wafer storage before epitaxial growth
dc.typeProceedings paper
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.conferenceSEMATECH Meeting
dc.source.conferencedate31/03/2008
dc.source.conferencelocationAustin, TX US
imec.availabilityPublished - imec


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