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Evaluation of the mask topography effect on te OPC modeling of hole patterns

dc.contributor.authorWard, Brian
dc.date.accessioned2021-10-17T12:44:16Z
dc.date.available2021-10-17T12:44:16Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14779
dc.sourceIIOimport
dc.titleEvaluation of the mask topography effect on te OPC modeling of hole patterns
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage69243S
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate26/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 6923


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