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A methodology for double patterning compliant split and design

dc.contributor.authorWiaux, Vincent
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorMatsuda, Takashi
dc.contributor.authorPostnikov, Sergey
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-17T12:47:32Z
dc.date.available2021-10-17T12:47:32Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14787
dc.sourceIIOimport
dc.titleA methodology for double patterning compliant split and design
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.source.peerreviewno
dc.source.beginpage71401X
dc.source.conferenceSPIE Lithography Asia
dc.source.conferencedate4/11/2008
dc.source.conferencelocationTaipei Taiwan
imec.availabilityPublished - imec
imec.internalnotesSPIE proceedings, Vol 7140


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