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Phase identification of self-forming Cu-Mn based diffusion barriers on p-SiOC:H and SiO2 dielectrics using x-ray absorption fine structures

dc.contributor.authorAblett, James
dc.contributor.authorWoicik, Joseph
dc.contributor.authorTokei, Zsolt
dc.contributor.authorList, Scott
dc.contributor.authorDimasi, Elaine
dc.date.accessioned2021-10-17T21:17:01Z
dc.date.available2021-10-17T21:17:01Z
dc.date.issued2009
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14860
dc.sourceIIOimport
dc.titlePhase identification of self-forming Cu-Mn based diffusion barriers on p-SiOC:H and SiO2 dielectrics using x-ray absorption fine structures
dc.typeJournal article
dc.contributor.imecauthorTokei, Zsolt
dc.source.peerreviewyes
dc.source.beginpage42112
dc.source.journalApplied Physics Letters
dc.source.issue4
dc.source.volume94
imec.availabilityPublished - imec


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