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Thermally-stable high effective work function TaCN thin films for metal gate electrode applications

dc.contributor.authorAdelmann, Christoph
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorConard, Thierry
dc.contributor.authorFranquet, Alexis
dc.contributor.authorSengoku, Naohisa
dc.contributor.authorOkuno, Yasutoshi
dc.contributor.authorFavia, Paola
dc.contributor.authorBender, Hugo
dc.contributor.authorZhao, Chao
dc.contributor.authorOSullivan, barry
dc.contributor.authorRothschild, Aude
dc.contributor.authorSchram, Tom
dc.contributor.authorKittl, Jorge
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorLehnen, Peer
dc.contributor.authorBoissière, Olivier
dc.contributor.authorLohe, Christoph
dc.date.accessioned2021-10-17T21:17:08Z
dc.date.available2021-10-17T21:17:08Z
dc.date.issued2009
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14868
dc.sourceIIOimport
dc.titleThermally-stable high effective work function TaCN thin films for metal gate electrode applications
dc.typeJournal article
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage53516
dc.source.journalJournal of Applied Physics
dc.source.issue5
dc.source.volume105
dc.identifier.urlhttp://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=JAPIAU000105000005053516000001&idtype=cvips&gifs=Yes
imec.availabilityPublished - imec


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