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Atomic layer deposition of GdAlOx and GdHfOx using Gd(iPr-Cp)3

dc.contributor.authorAdelmann, Christoph
dc.contributor.authorPierreux, Dieter
dc.contributor.authorSwerts, Johan
dc.contributor.authorKesters, Jurgen
dc.contributor.authorRichard, Olivier
dc.contributor.authorConard, Thierry
dc.contributor.authorFranquet, Alexis
dc.contributor.authorTielens, Hilde
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorSchaekers, Marc
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-17T21:17:09Z
dc.date.available2021-10-17T21:17:09Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14869
dc.sourceIIOimport
dc.titleAtomic layer deposition of GdAlOx and GdHfOx using Gd(iPr-Cp)3
dc.typeMeeting abstract
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorPierreux, Dieter
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage2035
dc.source.conference216th ECS Meeting
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access
imec.internalnotesMeeting Abstracts; Vol. MA2009-02


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