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Optimization of low-k UV curing: effect of wavelength on critical properties of the dielectric

dc.contributor.authorAksenov, German
dc.contributor.authorDe Roest, David
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorDultsev, F.N.
dc.contributor.authorMarsik, Prema
dc.contributor.authorShamiryan, Denis
dc.contributor.authorArai, H
dc.contributor.authorTakamura, N.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-17T21:17:30Z
dc.date.available2021-10-17T21:17:30Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14888
dc.sourceIIOimport
dc.titleOptimization of low-k UV curing: effect of wavelength on critical properties of the dielectric
dc.typeProceedings paper
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewyes
dc.source.beginpage1156-D02-08
dc.source.conferenceMaterials, Processes and Reliability for Advanced Interconnects for Micro- and Nanoelectronics
dc.source.conferencedate14/04/2009
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 1156


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